NTT-AT Leading-Edge Key Technology Product Infomation

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	-	Nanofabrication process services
		- EB lithography (Electron beam lithography)
		- Resist patterning
		- Etching process
		- Thin film fabrication
	-	"Custom-made" templates for Nanoimprint
	-	Templates for Nanoimprint < Standard templates >
	-	X-ray mask, EB mask, Photo mask
	-	V-groove grating (Blazed grating)
	-	Stencil products
	-	SiC membrane, SiN membrane
	-	Scale for metrology (Standard type scale)
	-	Scale for step height measuring (Standard type scale)
	-	Au nano patterns
	-	Conical structure nano pattern array (moth-eye structure for anti-reflection)

	-	Thin film fabrication
	-	Standard sample for in-depth profiling
	-	nm-scales for nm-beam size measurement
	-	X-ray analysis service

	-	X-ray chart (resolution chart)
	-	X-ray Fresnel Zone Plate(FZP)
	-	Transmission type grating / Pin hole
	-	Multilayer mirrors for extreme ultra-violet used for spectroscoping, image forming and reflection
	-	Design and fabrication of X-ray focusing systems
	-	Transmission filters for the extreme ultraviolet
	-	Beam splitter for soft x-ray